Automatically controlled In-Line thin film PVD Deposition & Etching system. Modular and flexible multi-chamber integration design to accommodate various substrate sizes. Automatic process control, visualization of the recipe management and process, data management and process documentation.

 

 

 

   Fully automatically controlled In-Line thin film PVD Deposition & Etching system for high throughput and reliable manufacturing processes.

   Modular and flexible multi-chamber integration design to accommodate various substrate sizes, offering exceptional production flexibility.

   Optimized system design for Linear/RF Plasma Etch, Planar/Rotary Magnetron Sputtering, Evaporation processes, with superior thin film deposition and etching uniformity.

   Windows based user friendly GUI software with FAB integration of SEMI GEM/SECS interface, and industrial standard DeviceNet/PLC control system for ease of operation, maintenance, support and upgrades.

   Fully automatic process control, visualization of the recipe management and process, data management and process documentation.

   Substrate Metallization

   Anti-Reflection & Transparent Conductive Oxides

   Decorative Coatings

   Adhesive Coatings

   Tribological Coatings

   EM Shielding Coatings

   Plasma Clean of Substrate

   Anneal of Substrate

   Aerospace

   Solar

   Optical Electronics

   Flat Panel Display

   Semiconductor

   MEMS

   LED, OLED