IBE System

Industry proven wafer process equipment with long term reliability. Versatile process flexibility in micro/nano machining & patterning. Excellent film etching uniformity & process repeatability.

Features

• Industry proven wafer process equipment with long term reliability.
• Versatile process flexibility in micro/nano machining & patterning.
• Excellent film etching uniformity & process repeatability with AVP innovative ion source design.
• Wide range of applications and low cost of ownership.
• Environmentally friendly with only inert gases used in process.

Technical Specifications

Applications

• Micro-Machining/Patterning/Shaping
• Communications & Microwave Components
• Biomedical and Medical Components & Sensors
• Hard Drive, MRAM and other Magnetic Devices
• Optical Sensors
• MEMS Circuits and Sensors
• Plasma Clean and Texturing
• HCD & LCD Grid Performance

High Current Density Process

Low Current Density Process

Gallery